Sputter

 

   

Model : UHV Sputter System sputter-24

Key parameters :

Substrate: 2 inch; Power supply: 1DC+1 RF

Sputter gun: 4; Targets: Pd, Pt, Au, Ni, Ti, Cu,Cr, Al

Gas type : N2 ,Ar,O2

Sample heating temperature : < 400 °C

Film uniformity : +/-5%

Base pressure : <5E-9 Torr